15th Workshop on Ontology Design and Patterns (WOP 2024)
Colocated with the 23rd International Semantic Web Conference (ISWC 2024)
November 12, 2024. Baltimore, Massachusetts.

Submission Instructions


This page contains instructions for submitting to WOP 2024. There are three categories of papers:

Research and Short Paper Submissions

We invite the submission of original research results related to the focus areas of the workshop. Research papers (maximum 12 pages CEUR style) should present mature work and document established results. Short papers (maximum 6 pages CEUR style) should present proposed research directions, novel ideas, or more general positions or discussions.

Submission guidelines

Review process and publication

Each paper will be reviewed by at least two reviewers. Final accept/reject decisions are made by the chairs based on these reviews. Acceptance is conditional, meaning that only accepted papers that perform the changes requested by the reviewers (this will be checked carefully by the chairs) and where at least one author registers for the workshop, will be included in the proceedings and in the workshop program. These papers will be made available online from the workshop webpage. Please note that ISWC usually does NOT allow "workshop-only" registrations, i.e. registering for the workshop will therefore require registering for the main conference + WOP.

Instructions for accepted papers, presentations, and post-proceedings will be provided later.

Detailed Instructions for Pattern Submissions

We invite the submission of new Ontology Design Patterns. Submissions will be composed of a pattern and a short paper (between 5 and 12 pages in CEUR style) describing the pattern, the problem it solves, the design rationale, trade-offs, real-world uses (if any) or other evaluation of fitness, etc.

The following is a list of detailed instructions that authors have to take into account in order to submit their patterns:

Review Process

Each submission will be reviewed by at least two members of the PC. Your pattern will be reviewed based on the following set of criteria:

Accepted patterns must be improved based on the review comments (i.e., an update of the patterns in the ODP portal is mandatory).